US Patent Issued to Hitachi High-Tech on July 1 for "Semiconductor analysis system" (Japanese Inventors)

ALEXANDRIA, Va., July 3 -- United States Patent no. 12,347,707, issued on July 1, was assigned to Hitachi High-Tech Corp. (Tokyo).

"Semiconductor analysis system" was invented by Yudai Kubo (Tokyo), Tsunenori Nomaguchi (Tokyo) and Hiroyuki Chiba (Tokyo).

According to the abstract* released by the U.S. Patent & Trademark Office: "A semiconductor analysis system includes a machining device that machines semiconductor wafer to prepare a thin film sample for observation, a transmission electron microscope device that acquires a transmission electron microscope image of the thin film sample, and a host control device that controls the machining device and the transmission electron microscope device. The host control device evaluates the thin f...