ALEXANDRIA, Va., July 3 -- United States Patent no. 12,347,656, issued on July 1, was assigned to Hitachi High-Tech Corp. (Tokyo).
"Plasma processing apparatus" was invented by Yasushi Sonoda (Tokyo), Naoki Yasui (Tokyo), Motohiro Tanaka (Tokyo) and Koichi Yamamoto (Tokyo).
According to the abstract* released by the U.S. Patent & Trademark Office: "A plasma processing apparatus includes a processing chamber, a radio frequency power source, and a magnetic-field generation unit. In the processing chamber, a sample is subjected to plasma processing. The radio frequency power source supplies radio frequency power for a microwave. The magnetic-field generation unit forms a magnetic field for generating plasma by an interaction with the microwa...