US Patent Issued to HITACHI HIGH-TECH on July 1 for "Defect inspection device, defect inspection method, and adjustment substrate" (Japanese Inventors)

ALEXANDRIA, Va., July 3 -- United States Patent no. 12,345,654, issued on July 1, was assigned to HITACHI HIGH-TECH Corp. (Tokyo).

"Defect inspection device, defect inspection method, and adjustment substrate" was invented by Yuta Urano (Tokyo), Eiji Arima (Tokyo), Hiromichi Yamakawa (Tokyo) and Toshifumi Honda (Tokyo).

According to the abstract* released by the U.S. Patent & Trademark Office: "A defect inspection device includes: an illumination optical system including a polarization element configured to switch polarization of irradiation light between first polarization and second polarization orthogonal to the first polarization; a polarization diffraction grating configured to emit diffraction light of a specific order of the irradi...