ALEXANDRIA, Va., Jan. 13 -- United States Patent no. 12,525,430, issued on Jan. 13, was assigned to Hitachi High-Tech Corp. (Tokyo).
"Charged particle beam apparatus" was invented by Kazufumi Yachi (Tokyo), Muneyuki Fukuda (Tokyo), Ichiro Tachibana (Tokyo) and Hiroya Ohta (Tokyo).
According to the abstract* released by the U.S. Patent & Trademark Office: "Proposed is a charged particle beam apparatus for the purpose of detecting a charged particle emitted from a sample in a specific direction by discriminating between the charged particle and a charged particle emitted in another direction. As one aspect of achieving the above purpose, proposed is a charged particle beam apparatus including an objective lens configured to focus a beam emi...