US Patent Issued to HITACHI HIGH-TECH on Feb. 3 for "Culturing apparatus setup method, assistance apparatus, and culturing apparatus" (Japanese Inventor)

ALEXANDRIA, Va., Feb. 3 -- United States Patent no. 12,540,304, issued on Feb. 3, was assigned to HITACHI HIGH-TECH Corp. (Tokyo).

"Culturing apparatus setup method, assistance apparatus, and culturing apparatus" was invented by Toyoshige Kobayashi (Tokyo).

According to the abstract* released by the U.S. Patent & Trademark Office: "According to the present invention, an initial-stage test apparatus-culturing condition (parameter set) is determined (22) on the basis of a manual culturing condition (26) for a specific cell. Multiple apparatus-culturing tests (20) are run in accordance with multiple test apparatus-culturing conditions, including the initial-stage test apparatus-culturing condition. A test apparatus-culturing condition at the...