ALEXANDRIA, Va., Feb. 19 -- United States Patent no. 12,230,471, issued on Feb. 18, was assigned to Hitachi High-Tech Corp. (Tokyo).

"Ion milling device" was invented by Shota Aida (Tokyo), Hisayuki Takasu (Tokyo), Atsushi Kamino (Tokyo) and Hitoshi Kamoshida (Tokyo).

According to the abstract* released by the U.S. Patent & Trademark Office: "There is provided an ion milling apparatus that can enhance reproducibility of ion distribution.The ion milling apparatus includes an ion source 101, a sample stage 102 on which a sample processed by radiating a non-convergent ion beam from the ion source 101 is placed, a drive unit 107 that moves a measurement member holding section 106 holding an ion beam current measurement member 105 along a trac...