ALEXANDRIA, Va., Dec. 31 -- United States Patent no. 12,511,729, issued on Dec. 30, was assigned to Hitachi High-Tech Corp. (Tokyo).

"Defect classification device and defect classification program" was invented by Yohei Minekawa (Tokyo), Takehiro Hirai (Tokyo) and Satoshi Takada (Tokyo).

According to the abstract* released by the U.S. Patent & Trademark Office: "An object of the present disclosure is to provide a defect classification device capable of easily grasping an appropriate recipe update timing of an imaging device when classification accuracy for classifying defects existing on a semiconductor wafer is decreased. The defect classification device according to the present disclosure calculates classification accuracy by further ac...