US Patent Issued to Hitachi High-Tech on Dec. 16 for "Observation system, observation method, and program" (Japanese Inventors)

ALEXANDRIA, Va., Dec. 16 -- United States Patent no. 12,500,061, issued on Dec. 16, was assigned to Hitachi High-Tech Corp. (Tokyo).

"Observation system, observation method, and program" was invented by Hiroaki Kasai (Tokyo), Kenji Yasui (Tokyo), Mayuka Osaki (Tokyo), Maki Kimura (Tokyo) and Makoto Suzuki (Tokyo).

According to the abstract* released by the U.S. Patent & Trademark Office: "The invention provides an observation system capable of observing a formation position of a target shape that cannot be directly irradiated with an electron beam. The observation system includes an electron microscope and a computer. The electron microscope is configured to irradiate, with an electron beam, a first surface position on a specimen, which i...