ALEXANDRIA, Va., Aug. 6 -- United States Patent no. 12,379,392, issued on Aug. 5, was assigned to Hitachi High-Tech Corp. (Tokyo).
"Surface analysis device" was invented by Ritsuo Fukaya (Tokyo), Yasuhiro Ando (Tokyo) and Yoshihiro Isozaki (Tokyo).
According to the abstract* released by the U.S. Patent & Trademark Office: "The present invention pertains to a surface analysis device (1) and provides a technology that can increase accuracy and quality of measurement and analysis even when a local deviation is generated in height information of a measurement result of a scanning probe microscope (SPM) (2), due to an atmospheric pressure change with respect to an airtight tank (10). The surface analysis device (1) is provided with: an airtigh...