ALEXANDRIA, Va., Aug. 20 -- United States Patent no. 12,394,586, issued on Aug. 19, was assigned to HITACHI HIGH-TECH Corp. (Tokyo).
"Charged particle beam device" was invented by Makoto Sakakibara (Tokyo), Momoyo Enyama (Tokyo), Hajime Kawano (Tokyo), Makoto Suzuki (Tokyo), Kenji Tanimoto (Tokyo) and Yuko Sasaki (Tokyo).
According to the abstract* released by the U.S. Patent & Trademark Office: "To provide a charged particle beam device including a booster electrode and an object lens that generates a magnetic field in a vicinity of a sample, and capable of preventing ion discharge, an insulator is disposed between a magnetic field lens and the booster electrode. A tip of the insulator protrudes to a tip side of an upper magnetic path fr...