US Patent Issued to HITACHI HIGH-TECH on Aug. 12 for "Calibration sample, manufacturing method for calibration sample, and calibration method for autofocus target position" (Japanese Inventor)

ALEXANDRIA, Va., Aug. 12 -- United States Patent no. 12,386,149, issued on Aug. 12, was assigned to HITACHI HIGH-TECH Corp. (Tokyo).

"Calibration sample, manufacturing method for calibration sample, and calibration method for autofocus target position" was invented by Akira Masuya (Tokyo).

According to the abstract* released by the U.S. Patent & Trademark Office: "Provided is a calibration sample that can be used for three-dimensional structures and is unlikely to change over time. To this end, the calibration sample is a calibration sample for an autofocus target position in an optical microscope, and comprises a light-transmissive resin sample container that accommodates a first layer, which is disposed on a bottom side along the optica...