ALEXANDRIA, Va., Aug. 12 -- United States Patent no. 12,387,921, issued on Aug. 12, was assigned to HITACHI HIGH-TECH Corp. (Tokyo).
"Apparatus diagnostic apparatus, apparatus diagnostic method, plasma processing apparatus and semiconductor device manufacturing system" was invented by Shota Umeda (Tokyo), Masahiro Sumiya (Tokyo), Yoshito Kamaji (Tokyo) and Kenji Tamaki (Tokyo).
According to the abstract* released by the U.S. Patent & Trademark Office: "In a plasma processing apparatus, occurrence of unplanned maintenance is predicted in advance so that a time when the work should be incorporated into planned maintenance can be determined. An apparatus diagnostic apparatus including a degradation score estimation unit that receives an outp...