ALEXANDRIA, Va., June 6 -- United States Patent no. 12,283,452, issued on April 22, was assigned to Hitachi High-Tech Corp. (Tokyo).
"Charged particle beam apparatus" was invented by Hiroshi Morita (Tokyo), Takashi Kubo (Tokyo), Minoru Sakamaki (Tokyo), Shuhei Ishikawa (Tokyo) and Shunichi Watanabe (Tokyo).
According to the abstract* released by the U.S. Patent & Trademark Office: "Provided is a charged particle beam apparatus capable of realizing a highly reliable insulating structure. This charged particle beam apparatus emits a charged particle beam from a charged particle beam emission device onto a sample, detects charged particles generated from the sample, and creates a sample image or processes the sample. The charged particle bea...