US Patent Issued to HITACHI HIGH-TECH ANALYSIS on Jan. 13 for "X-ray inspection apparatus and method of inspection with X-rays" (Japanese Inventors)

ALEXANDRIA, Va., Jan. 13 -- United States Patent no. 12,523,620, issued on Jan. 13, was assigned to HITACHI HIGH-TECH ANALYSIS Corp. (Tokyo).

"X-ray inspection apparatus and method of inspection with X-rays" was invented by Toshiyuki Takahara (Tokyo), Tsuneo Sato (Tokyo), Satoshi Matsubara (Tokyo), Yuta Seki (Tokyo) and Kazuya Iwata (Tokyo).

According to the abstract* released by the U.S. Patent & Trademark Office: "Proposed are an X-ray inspection apparatus and a method of inspection with X-rays in which foreign objects in even a sample in which bending, sagging, or curving may occur can be inspected accurately. The X-ray inspection apparatus includes an X-ray source (2) which irradiates a sample with an X-ray, an X-ray detection unit (3...