ALEXANDRIA, Va., March 26 -- United States Patent no. 12,262,460, issued on March 25, was assigned to HIGHLIGHT TECH CORP. (Tainan, Taiwan) and Finese Technology Co. Ltd. (Hsinchu County, Taiwan).
"Fast annealing equipment" was invented by Chwung-Shan Kou (Hsinchu County, Taiwan).
According to the abstract* released by the U.S. Patent & Trademark Office: "A fast annealing equipment is applicable to the annealing treatment of silicon carbide wafers. The fast annealing equipment comprises a variable frequency microwave power source system, a resonant chamber heating system and a measurement and control system. The variable frequency microwave power source system uses a solid state power amplifier and has the flexibility of fast frequency sw...