US Patent Issued to HEWLETT-PACKARD DEVELOPMENT on June 3 for "Interferential patterns for alignment calibration of printheads" (Spanish Inventors)

ALEXANDRIA, Va., June 4 -- United States Patent no. 12,319,056, issued on June 3, was assigned to HEWLETT-PACKARD DEVELOPMENT COMPANY LP (Spring, Texas).

"Interferential patterns for alignment calibration of printheads" was invented by Raul Rodriguez Alonso (Sant Cugat del Valles, Spain), Marti Rius Rossell (Sant Cugat del Valles, Spain), Leyre Hernandez Martinez (Sant Cugat del Valles, Spain) and Victor Serra Fernandez (Sant Cugat del Valles, Spain).

According to the abstract* released by the U.S. Patent & Trademark Office: "An interferential pattern is printed to a print media using an upper row die. A first portion of an additional interferential pattern is printed to a print media using a lower row die. A second portion of the additio...