US Patent Issued to Heraeus Covantics North America on Aug. 5 for "Controlled porosity yttrium oxide for etch applications" (German, American Inventors)

ALEXANDRIA, Va., Aug. 6 -- United States Patent no. 12,378,163, issued on Aug. 5, was assigned to Heraeus Covantics North America LLC (Chandler, Ariz.).

"Controlled porosity yttrium oxide for etch applications" was invented by Matthew Joseph Donelon (Chandler, Ariz.), Saurav Bista (Chandler, Ariz.), Saurabh Waghmare (Chandler, Ariz.), Chase Davis (Chandler, Ariz.), Michael Weissmayer (Hanau, Germany) and Felix Franz (Hanau, Germany).

According to the abstract* released by the U.S. Patent & Trademark Office: "A sintered yttrium oxide body having a total impurity level of 40 ppm or less, a density of not less than 4.93 g/cm3, wherein the sintered yttrium oxide body has at least one surface comprising at least one pore, wherein no pore is la...