ALEXANDRIA, Va., Jan. 13 -- United States Patent no. 12,522,925, issued on Jan. 13, was assigned to HANWHA PRECISION MACHINERY Co. LTD. (Changwon-si, South Korea).
"Thin film deposition apparatus having multi-stage heaters and thin film deposition method using the same" was invented by Ram Woo (Seoul, South Korea), Sang Bo Kim (Seoul, South Korea), Jin Hwan Lee (Seoul, South Korea), Min Ho Cheon (Seoul, South Korea) and Seung Jun Lee (Seoul, South Korea).
According to the abstract* released by the U.S. Patent & Trademark Office: "A thin film deposition apparatus includes: a chamber configured to process a plurality of substrates; a plurality of heater members disposed to correspond to the substrates to heat the substrates, respectively; a...