ALEXANDRIA, Va., Jan. 20 -- United States Patent no. 12,527,560, issued on Jan. 20, was assigned to Hangzhou Dinova EP Technology Co. Ltd. (Hangzhou, China).
"Occluder and occlusion system" was invented by Jianglang Zhao (Hangzhou, China), Xiaoyang Cheng (Hangzhou, China), Jie Chen (Hangzhou, China) and Yongsheng Wang (Hangzhou, China).
According to the abstract* released by the U.S. Patent & Trademark Office: "The present application provides an occluder, for use in occluding a defect in a vascular system. The occluder comprises a first occlusion disc, a second occlusion disc, and a tightening wire; the first occlusion disc and the second occlusion disc are used for covering different openings of a defect, respectively; a connector is pr...