US Patent Issued to HANBAL MASSTECH on July 29 for "Gas dispersion device for improving performance of rectangular scrubber" (South Korean Inventors)

ALEXANDRIA, Va., July 30 -- United States Patent no. 12,370,494, issued on July 29, was assigned to HANBAL MASSTECH Ltd. (Gimhae-si, South Korea).

"Gas dispersion device for improving performance of rectangular scrubber" was invented by Sung Won Lee (Gimhae-si, South Korea) and Ki Joon Kang (Ulsan, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "A gas dispersion device capable of improving the performance of a rectangular scrubber includes: a scrubber having a rectangular shape; and a gas inlet configured to introduce gas into the scrubber, the gas inlet being mounted on the scrubber and having a rectangular shape."

The patent was filed on Oct. 26, 2021, under Application No. 18/024,420.

*For fu...