US Patent Issued to HAMAMATSU PHOTONICS on Oct. 28 for "Sample observation device and sample observation method" (Japanese Inventor)

ALEXANDRIA, Va., Oct. 28 -- United States Patent no. 12,455,241, issued on Oct. 28, was assigned to HAMAMATSU PHOTONICS K.K. (Hamamatsu, Japan).

"Sample observation device and sample observation method" was invented by Satoshi Yamamoto (Hamamatsu, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "In this sample observation device, a reference table in which an optimum light amount of planar light at a measurement sensitivity represented by the product of a light amount of the planar light and a scanning speed is set according to the scanning speed is referred to, and the scanning speed of a scanning unit and the optimum light amount of the planar light that is applied to a sample are determined on the bas...