US Patent Issued to HAMAMATSU PHOTONICS on Nov. 11 for "Height measurement apparatus and height measurement method" (Japanese Inventors)

ALEXANDRIA, Va., Nov. 11 -- United States Patent no. 12,467,739, issued on Nov. 11, was assigned to HAMAMATSU PHOTONICS K.K. (Shizuoka, Japan).

"Height measurement apparatus and height measurement method" was invented by Tomonori Nakamura (Hamamatsu, Japan) and Kunihiko Tsuchiya (Hamamatsu, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A height measurement apparatus includes: a light irradiation unit that irradiates a sample with irradiation light; a camera system that detects light from the sample irradiated with the irradiation light; and a control apparatus that calculates a height of the sample based on the wavelength information. The camera system includes an inclined dichroic mirror of which a t...