ALEXANDRIA, Va., Feb. 19 -- United States Patent no. 12,228,515, issued on Feb. 18, was assigned to HAMAMATSU PHOTONICS K.K. (Hamamatsu, Japan).
"Inspection apparatus and inspection method" was invented by Tomonori Nakamura (Hamamatsu, Japan).
According to the abstract* released by the U.S. Patent & Trademark Office: "An inspection apparatus is an inspection apparatus for inspecting a sample in which a plurality of light-emitting elements including a first light-emitting element and a second light-emitting element arranged around the first light-emitting element is formed, the inspection apparatus including an excitation light source that generates excitation light to irradiate the sample, a camera that images fluorescence from the sample...