US Patent Issued to HAMAMATSU PHOTONICS on Dec. 16 for "X-ray focal spot shape evaluation device and x-ray focal spot shape evaluation method" (Japanese Inventor)

ALEXANDRIA, Va., Dec. 16 -- United States Patent no. 12,498,335, issued on Dec. 16, was assigned to HAMAMATSU PHOTONICS K.K. (Hamamatsu, Japan).

"X-ray focal spot shape evaluation device and x-ray focal spot shape evaluation method" was invented by Hisaya Hotaka (Hamamatsu, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "An X-ray focal spot shape evaluation apparatus is an apparatus for evaluating an X-ray focal spot shape including an X-ray focal spot size on a target of an X-ray source, and includes an imaging unit and an operation unit. The imaging unit acquires a phase contrast image in a range including an edge of an object disposed on a propagation path of X-rays generated on the target of the X-r...