ALEXANDRIA, Va., Aug. 12 -- United States Patent no. 12,387,309, issued on Aug. 12, was assigned to HAMAMATSU PHOTONICS K.K. (Hamamatsu, Japan).
"Inspection apparatus and inspection method" was invented by Tomonori Nakamura (Hamamatsu, Japan), Kenichiro Ikemura (Hamamatsu, Japan) and Akihiro Otaka (Hamamatsu, Japan).
According to the abstract* released by the U.S. Patent & Trademark Office: "An inspection apparatus is an inspection apparatus includes an excitation light source that generates excitation light to irradiate the object, a dichroic mirror that separates fluorescence from the sample by transmitting or reflecting the fluorescence according to a wavelength, a camera that images fluorescence reflected by the dichroic mirror, a cam...