US Patent Issued to Hae Young Choi, SW on June 17 for "Front flap-integrated uniform with anti-lifting and volume retention functions" (South Korean Inventors)

ALEXANDRIA, Va., June 19 -- United States Patent no. 12,329,221, issued on June 17, was assigned to Hae Young Choi (Daegu, South Korea) and SW COMPANY Co. LTD. (Daegu, South Korea).

"Front flap-integrated uniform with anti-lifting and volume retention functions" was invented by Hae Young Choi (Daegu, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "The present disclosure relates to a front flap-integrated uniform with anti-lifting and volume retention functions that makes it extremely easy to wear the front flap-integrated with the uniform through zipper operation, that keeps firmly in contact with a body without shifting and retains the volume of the body even under various movements of the wearer...