US Patent Issued to Haag-Streit on June 3 for "Image exposure techniques for ophthalmic microscope devices" (Swiss Inventors)

ALEXANDRIA, Va., June 4 -- United States Patent no. 12,323,712, issued on June 3, was assigned to Haag-Streit AG (Koniz, Switzerland).

"Image exposure techniques for ophthalmic microscope devices" was invented by Alain Weber (Koniz, Switzerland) and Philipp Gloor (Koniz, Switzerland).

According to the abstract* released by the U.S. Patent & Trademark Office: "Image exposure in an ophthalmic microscope device is controlled by first recording a camera image with the camera of the microscope using first exposure parameters. Edge detection, e.g., based on convolution using a discrete differential operator, is then used to identify regions where the image has high and low edge densities. A brightness parameter of the camera image is calculated...