US Patent Issued to GUDENG PRECISION INDUSTRIAL on July 1 for "Gas diffusion device, and wafer container including the same" (Taiwanese Inventors)

ALEXANDRIA, Va., July 3 -- United States Patent no. 12,347,711, issued on July 1, was assigned to GUDENG PRECISION INDUSTRIAL Co. LTD. (New Taipei, Taiwan).

"Gas diffusion device, and wafer container including the same" was invented by Ming-Chien Chiu (New Taipei, Taiwan), Chia-Ho Chuang (New Taipei, Taiwan), Kuo-Hua Lee (New Taipei, Taiwan), Shu-Hung Lin (New Taipei, Taiwan) and Hao-Kang Hsia (New Taipei, Taiwan).

According to the abstract* released by the U.S. Patent & Trademark Office: "The present invention provides a wafer container and a gas diffusion device applied in the wafer container. The wafer container includes a shell, and all components included and applied on the shell are made of thermal resistance materials. The gas diff...