US Patent Issued to Guangzhou Sigtenna Technology on Feb. 10 for "Lens for electromagnetic waves based on artificial dielectric material" (Chinese Inventor)

ALEXANDRIA, Va., Feb. 11 -- United States Patent no. 12,548,894, issued on Feb. 10, was assigned to Guangzhou Sigtenna Technology Co. Ltd. (Guangzhou, China).

"Lens for electromagnetic waves based on artificial dielectric material" was invented by Zimeng Li (Guangdong, China).

According to the abstract* released by the U.S. Patent & Trademark Office: "A cylindrical focusing lens, including a dielectric radome (9, 49) and artificial dielectric material, in which the artificial dielectric material includes a plurality of sheets of a foam dielectric material disposed in layers and a plurality of conductive tubes placed in the sheets of the foam dielectric material, in which the conductive tubes disposed in the sheets of the foam dielectric m...