ALEXANDRIA, Va., June 4 -- United States Patent no. 12,318,773, issued on June 3, was assigned to Go!Foton Inc. (Ibaraki, Japan).
"Reaction processing vessel" was invented by Osamu Kawaguchi (Tokyo), Takashi Fukuzawa (Tokyo) and Hidemitsu Takeuchi (Tokyo).
According to the abstract* released by the U.S. Patent & Trademark Office: "A reaction processing vessel includes: a substrate made of resin; and a groove-like channel provided on a main surface of the substrate. The channel includes a bottom surface and a side surface. In a reaction channel for causing a sample to develop a predetermined reaction, the bottom surface and the side surface are connected by a curved surface."
The patent was filed on Oct. 4, 2021, under Application No. 17/...