ALEXANDRIA, Va., Sept. 23 -- United States Patent no. 12,424,493, issued on Sept. 23, was assigned to GlobalFoundries U.S. Inc. (Malta, N.Y.).
"Self-aligned double patterning with mandrel manipulation" was invented by James Mazza (Saratoga Springs, N.Y.), David Pritchard (Glenville, N.Y.), Romain Feuillette (Williston, Vt.), Elizabeth Strehlow (Cleveland, Ga.) and Hongru Ren (Mechanicville, N.Y.).
According to the abstract* released by the U.S. Patent & Trademark Office: "Structures with features formed by self-aligned double patterning and methods of self-aligned multiple patterning. The structure comprises a first field-effect transistor including a first gate and a first protrusion projecting laterally from the first gate, and a second...