ALEXANDRIA, Va., Sept. 3 -- United States Patent no. 12,405,423, issued on Sept. 2, was assigned to GLOBALFOUNDRIES U.S. Inc. (Malta, N.Y.).
"Hybrid edge couplers with voids" was invented by Yusheng Bian (Ballston Lake, N.Y.), Sunoo Kim (Halfmoon, N.Y.) and Edward W. Kiewra (South Burlington, Vt.).
According to the abstract* released by the U.S. Patent & Trademark Office: "The present disclosure relates to semiconductor structures and, more particularly, to hybrid edge couplers with voids and methods of manufacture. The structure includes: a dielectric material; at least one waveguide structure embedded within the dielectric material; and at least one airgap within the dielectric material and extending along a length of the at least one w...