ALEXANDRIA, Va., Nov. 18 -- United States Patent no. 12,474,519, issued on Nov. 18, was assigned to GlobalFoundries U.S. Inc. (Malta, N.Y.).
"Photonics chip patterning with multiple photoresist layers" was invented by Brittany Hedrick (Lagrangeville, N.Y.), Ian Melville (Highland, N.Y.), Michael David Webster (Poughkeepsie, N.Y.), Harry Cox (Rifton, N.Y.), Jorge Lubguban (Danbury, Conn.) and Sarah Knickerbocker (East Fishkill, N.Y.).
According to the abstract* released by the U.S. Patent & Trademark Office: "Structures for a photonics chip that include a cavity or groove and methods of forming same. The structure comprises a semiconductor substrate including a first opening, a back-end-of-line stack on the semiconductor substrate, and a d...