ALEXANDRIA, Va., June 12 -- United States Patent no. 12,300,627, issued on May 13, was assigned to GlobalFoundries U.S. Inc. (Malta, N.Y.).
"Integrated circuit structures having a watermark" was invented by Alain Loiseau (Williston, Vt.), Peter Coutu (Williston, Vt.) and Romain Feuillette (Williston, Vt.).
According to the abstract* released by the U.S. Patent & Trademark Office: "Structures for an integrated circuit having a watermark and related methods. The structure comprises a first semiconductor structure including at least one feature with a variation relative to a second semiconductor structure including the at least one feature without the variation. The variation provides a watermark for identifying a Process Design Kit used to ...