US Patent Issued to GlobalFoundries U.S. on March 18 for "System and method for detecting a defect in a specimen" (German, American Inventors)

ALEXANDRIA, Va., March 19 -- United States Patent no. 12,253,472, issued on March 18, was assigned to GlobalFoundries U.S. Inc. (Malta, N.Y.).

"System and method for detecting a defect in a specimen" was invented by Richard Paul Good (Saratoga Springs, N.Y.), Roberto Schiwon (Dresden, Germany), Matthias Ruhm (Dresden, Germany) and Dirk Wollstein (Dresden, Germany).

According to the abstract* released by the U.S. Patent & Trademark Office: "The present disclosure generally relates to a system and a method for detecting a defect in a specimen. More particularly, the present disclosure relates to a lithography exposure system and a method for detecting a dispensing error in a wafer The present disclosure provides a system for detecting a def...