ALEXANDRIA, Va., July 3 -- United States Patent no. 12,349,444, issued on July 1, was assigned to GLOBALFOUNDRIES Singapore Pte. Ltd (Singapore).

"Under-source body contact" was invented by Rui Tze Toh (Singapore), Fangyue Liu (Singapore) and Mark David Jaffe (Shelburne, Vt.).

According to the abstract* released by the U.S. Patent & Trademark Office: "The present disclosure relates to semiconductor structures and, more particularly, to under-body source contact structures and methods of manufacture. The structure includes: a gate structure on a semiconductor layer; a drift region within the semiconductor layer, below the gate structure; a body region within the semiconductor layer, below the gate structure; a contact region within the bod...