US Patent Issued to Gigaphoton on Sept. 30 for "Extreme ultraviolet light generation chamber device and electronic device manufacturing method" (Japanese Inventor)

ALEXANDRIA, Va., Sept. 30 -- United States Patent no. 12,432,839, issued on Sept. 30, was assigned to Gigaphoton Inc. (Tochigi, Japan).

"Extreme ultraviolet light generation chamber device and electronic device manufacturing method" was invented by Atsushi Ueda (Oyama, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "An extreme ultraviolet light generation chamber device includes a chamber including, at an internal space thereof, a plasma generation region; an etching gas supply port supplying an etching gas; a cylindrical partition wall surrounding the plasma generation region, and having an opening on the internal space side as an inlet port and an opening at the outside of the chamber as an exhaust po...