US Patent Issued to GIGAPHOTON on Oct. 28 for "EUV light generation apparatus, electronic device manufacturing method, and inspection method" (Japanese Inventors)

ALEXANDRIA, Va., Oct. 28 -- United States Patent no. 12,455,231, issued on Oct. 28, was assigned to GIGAPHOTON INC. (Tochigi, Japan).

"EUV light generation apparatus, electronic device manufacturing method, and inspection method" was invented by Yuichi Nishimura (Tochigi, Japan) and Yoshifumi Ueno (Tochigi, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "An EUV light generation apparatus includes a chamber; a prepulse laser outputting prepulse laser light; a main pulse laser outputting main pulse laser light; a combiner combining optical paths of the prepulse laser light and the main pulse laser light; a light concentrating unit concentrating, on the target, the prepulse laser light and the main pulse l...