US Patent Issued to Gigaphoton on June 17 for "Target supply system, extreme ultraviolet light generation apparatus, and electronic device manufacturing method" (Japanese Inventors)

ALEXANDRIA, Va., June 19 -- United States Patent no. 12,332,575, issued on June 17, was assigned to Gigaphoton Inc. (Tochigi, Japan).

"Target supply system, extreme ultraviolet light generation apparatus, and electronic device manufacturing method" was invented by Fumio Iwamoto (Oyama, Japan), Atsushi Ueda (Oyama, Japan) and Takayuki Yabu (Oyama, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A target supply system includes a load lock chamber configured to contain a solid target substance, a solid target supply pipe connected to the load lock chamber, a pressure regulator configured to regulate an externally supplied gas pressure, a gas pressure supply pipe connected to the pressure regulator, a melti...