US Patent Issued to Gigaphoton on Jan. 20 for "EUV light generation system and electronic device manufacturing method" (Japanese Inventors)

ALEXANDRIA, Va., Jan. 20 -- United States Patent no. 12,532,401, issued on Jan. 20, was assigned to Gigaphoton Inc. (Tochigi, Japan).

"EUV light generation system and electronic device manufacturing method" was invented by Yuichi Nishimura (Oyama, Japan) and Yoshifumi Ueno (Oyama, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "An EUV light generation system includes a prepulse laser device outputting prepulse laser light to be radiated to a target supplied into a chamber; a main pulse laser device outputting main pulse laser light to be radiated to a diffusion target generated by the radiation of the prepulse laser light; a first actuator adjusting an irradiation position of the prepulse laser light; a...