US Patent Issued to Georgia Tech Research on Jan. 20 for "Projection two-photon lithography method and system for rapid printing of 3D structures with sub-micrometer features and porosities" (Georgia Inventors)

ALEXANDRIA, Va., Jan. 20 -- United States Patent no. 12,528,246, issued on Jan. 20, was assigned to Georgia Tech Research Corp. (Atlanta).

"Projection two-photon lithography method and system for rapid printing of 3D structures with sub-micrometer features and porosities" was invented by Sourabh Kumar Saha (Atlanta), Harnjoo Kim (Atlanta) and Rushil Pingali (Atlanta).

According to the abstract* released by the U.S. Patent & Trademark Office: "Systems, methods, devices, and compositions of matter for 3D printing methods and systems that can be used for rapid nanoscale 3D printing of large and deterministic 3D structures with sub-micrometer features and porosities. The method includes storing or determining a plurality of interspersed featu...