US Patent Issued to GENEWEL on June 17 for "Hyaluronic acid-based dissolving film, production method thereof, and release liner used for the same" (South Korean Inventors)

ALEXANDRIA, Va., June 19 -- United States Patent no. 12,329,860, issued on June 17, was assigned to GENEWEL Co. LTD. (South Korea).

"Hyaluronic acid-based dissolving film, production method thereof, and release liner used for the same" was invented by Jun Ho Kim (Gyeonggi-do, South Korea), Mi Ran Cho (Gyeonggi-do, South Korea) and Hye Ri Lee (Daejeon, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "The present invention relates to a hyaluronic acid-based dissolving film, a production method thereof, and a release liner used for the same, and more particularly to a method for producing a hyaluronic acid-based dissolving film that provides a hyaluronic acid-based dissolving film having high performa...