ALEXANDRIA, Va., Aug. 12 -- United States Patent no. 12,386,261, issued on Aug. 12, was assigned to Geminatio Inc. (Schenectady, N.Y.).
"In-resist process for high density contact formation" was invented by Brennan Peterson (Longmont, Colo.) and Phillip D. Hustad (Longmont, Colo.).
According to the abstract* released by the U.S. Patent & Trademark Office: "A method of microfabrication includes forming a first relief pattern on a target layer of a substrate, coating the first relief pattern with a first solubility-shifting agent, layering a first polymeric fill on the first relief pattern, and diffusing the first solubility-shifting agent into the first polymeric fill to provide a solubility-shifted region of the first polymeric fill. Then...