ALEXANDRIA, Va., Feb. 11 -- United States Patent no. 12,546,015, issued on Feb. 10, was assigned to GE INFRASTRUCTURE TECHNOLOGY LLC (Greenville, S.C.).
"Fluoride ion cleaning systems and methods including post-retort fluid stream processing" was invented by James C. Dalton (Pickens, S.C.) and Jonathan Lomas (Simpsonville, S.C.).
According to the abstract* released by the U.S. Patent & Trademark Office: "A fluoride ion cleaning system includes a retort for cleaning at least one component via a working fluid supplied to the retort, a post-retort subsystem for processing a post-retort fluid stream exiting the retort at a first temperature, and a scrubber downstream from the post-retort subsystem. The post-retort subsystem includes a separat...