ALEXANDRIA, Va., June 10 -- United States Patent no. 12,293,900, issued on May 6, was assigned to GALLIUM ENTERPRISES PTY LTD (New South Wales, Australia).
"Apparatus and method for film formation" was invented by Satyanarayan Barik (Holroyd, Australia), Marie-Pierre Francoise Wintrebert Ep Fouquet (Silverwater, Australia) and Ian Mann (Silverwater, Australia).
According to the abstract* released by the U.S. Patent & Trademark Office: "An apparatus and method for forming a thin film on a substrate by RPCVD which provides for very low levels of carbon and oxygen impurities and includes the steps of introducing a Group VA plasma into a first deposition zone of a growth chamber, introducing a Group IIIA reagent into a second deposition zone ...