ALEXANDRIA, Va., June 18 -- United States Patent no. 12,325,639, issued on June 10, was assigned to FUSO CHEMICAL Co. LTD. (Osaka, Japan).
"Colloidal silica and production method therefor" was invented by Hideki Otsuki (Fukuchiyama, Japan), Yoshiki Michiwaki (Fukuchiyama, Japan), Yuma Negishi (Fukuchiyama, Japan) and Toshiki Chiba (Fukuchiyama, Japan).
According to the abstract* released by the U.S. Patent & Trademark Office: "The present invention provides colloidal silica that exhibits excellent abrasiveness and contains, with high purity, deformed silica particles with excellent compactness and a large amount of alkoxy groups per unit area; the invention also provides a method for producing the colloidal silica in a simple manner with ...