ALEXANDRIA, Va., Jan. 13 -- United States Patent no. 12,522,506, issued on Jan. 13, was assigned to FUSO CHEMICAL Co. LTD. (Osaka, Japan).
"Colloidal silica and method for producing same" was invented by Yuka Fujimura (Fukuchiyama, Japan) and Yoshiki Michiwaki (Fukuchiyama, Japan).
According to the abstract* released by the U.S. Patent & Trademark Office: "The present invention provides colloidal silica containing silica particles excellent in compactness and excellent in maintenance of the bumpy surface under basic conditions, and provides a method for producing the colloidal silica. The present invention provides colloidal silica containing silica particles having a bumpy surface, wherein (1) the silica particles have a content of alkox...