ALEXANDRIA, Va., Aug. 6 -- United States Patent no. 12,378,126, issued on Aug. 5, was assigned to FUSO CHEMICAL Co. LTD. (Osaka, Japan).

"Colloidal silica, and method for production thereof" was invented by Hiroaki Yamashita (Fukuchiyama, Japan), Yuma Shibuichi (Fukuchiyama, Japan) and Yuka Fujimura (Fukuchiyama, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "Colloidal silica containing silica particles that have a small particle size (e.g., an average primary particle size of 20 nm or less) and that contain alkoxy groups, and a method for producing the colloidal silica, are disclosed. The colloidal silica containing silica particles can have a small particle size and exhibit a suppressed increase in t...