ALEXANDRIA, Va., June 9 -- United States Patent no. 12,286,356, issued on April 29, was assigned to FUSO CHEMICAL Co. LTD. (Osaka, Japan).
"Colloidal silica and method for producing same" was invented by Yuma Negishi (Fukuchiyama, Japan), Hideki Otsuki (Fukuchiyama, Japan), Hiroaki Yamashita (Fukuchiyama, Japan) and Toshiki Chiba (Fukuchiyama, Japan).
According to the abstract* released by the U.S. Patent & Trademark Office: "A colloidal silica is disclosed that contains, with high purity, silica particles having an appropriate particle density, a high aggregation ratio, and a high alkoxy group content, and to provide a method for producing the colloidal silica in a simple manner at reduced costs. The colloidal silica containing silica pa...