US Patent Issued to FURUYA METAL on Jan. 13 for "Sputtering target" (Japanese Inventors)

ALEXANDRIA, Va., Jan. 13 -- United States Patent no. 12,522,913, issued on Jan. 13, was assigned to FURUYA METAL Co. LTD..

"Sputtering target" was invented by Tomohiro Maruko (Tokyo), Yu Suzuki (Tokyo), Shohei Otomo (Tokyo) and Hironobu Nakamura (Tokyo).

According to the abstract* released by the U.S. Patent & Trademark Office: "The sputtering target of the present disclosure includes: an aluminum matrix; and (1) a material or phase containing aluminum and further containing either a rare earth element or a titanium group element or both a rare earth element and a titanium group element or (2) a material or phase containing either a rare earth element or a titanium group element or both a rare earth element and a titanium group element, a...